2018
![](https://osujilab.seas.upenn.edu/wp-content/uploads/2020/01/10.1115-1.4041532-300x139.jpg)
3D Compatible Sacrificial Nanoimprint Lithography for Tuning the Wettability of Thermoplastic Materials. M. Hasan, I. Shajahan, M. Gopinadhan, J. Ketkaew, A. Anesgart, C. Cho, S. Chopra, M. Higgins, S. Reyes, J. Schroers, C. O. Osuji, J. Singer. Journal of Micro and Nano-Manufacturing (2018). doi:10.1115/1.4041532
![](https://osujilab.seas.upenn.edu/wp-content/uploads/2020/01/10.1021-8b01409-300x121.jpg)
Self-Assembly of an Ultrahigh-χ Block Copolymer with Versatile Etch Selectivity. K. Azuma, J. Sun, Y. Choo, Y. Rokhlenko, J. H. Dwyer, B. Schweitzer, T. Hayakawa, C. O. Osuji, P. Gopalan. Macromolecules, 51 (16), 6460–6467 (2018). doi:10.1021/acs.macromol.8b01409
![](https://osujilab.seas.upenn.edu/wp-content/uploads/2020/01/10.1021-8b00364-300x154.jpg)
Fabrication of a Desalination Membrane with Enhanced Microbial Resistance through Vertical Alignment of Graphene Oxide. X. Lu, X. Feng, X. Zhang, M. N. Chukwu, C. O. Osuji, M. Elimelech. Environmental Science & Technology Letters (2018). doi:10.1021/acs.estlett.8b00364
2018 (no images in mobile)
![](https://osujilab.seas.upenn.edu/wp-content/uploads/2020/01/10.1115-1.4041532-300x139.jpg)
3D Compatible Sacrificial Nanoimprint Lithography for Tuning the Wettability of Thermoplastic Materials. M. Hasan, I. Shajahan, M. Gopinadhan, J. Ketkaew, A. Anesgart, C. Cho, S. Chopra, M. Higgins, S. Reyes, J. Schroers, C. O. Osuji, J. Singer. Journal of Micro and Nano-Manufacturing (2018). doi:10.1115/1.4041532
![](https://osujilab.seas.upenn.edu/wp-content/uploads/2020/01/10.1021-8b01409-300x121.jpg)
Self-Assembly of an Ultrahigh-χ Block Copolymer with Versatile Etch Selectivity. K. Azuma, J. Sun, Y. Choo, Y. Rokhlenko, J. H. Dwyer, B. Schweitzer, T. Hayakawa, C. O. Osuji, P. Gopalan. Macromolecules, 51 (16), 6460–6467 (2018). doi:10.1021/acs.macromol.8b01409
![](https://osujilab.seas.upenn.edu/wp-content/uploads/2020/01/10.1021-8b00364-300x154.jpg)
Fabrication of a Desalination Membrane with Enhanced Microbial Resistance through Vertical Alignment of Graphene Oxide. X. Lu, X. Feng, X. Zhang, M. N. Chukwu, C. O. Osuji, M. Elimelech. Environmental Science & Technology Letters (2018). doi:10.1021/acs.estlett.8b00364